Process and equipment simulation
Development of new technologies needs new or optimized processes and equipment. Especially for this, advanced models and simulation tools for PVD and CVD steps are currently built up as a new focus. They support the development of improved deposition techniques by optimization of process conditions, reactor configuration and feature topography.
Because processing with large scaled wafer diameters and charges need high capital requirements, processes have to be developed and optimized with minimum expenditure of necessary experimental tests. By means of appropriate simulations is it possible to estimate chances and risks of new technologies and to determine convenient process windows. The knowledge and experience of the simulations are made available for our customers and partners to optimize process parameters and equipment.
Prof. Dr. Stefan E. Schulz
Dr. Reinhard Streiter