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Center for Micro and Nano Technologies
Publications
Center for Micro and Nano Technologies 

Year 2025

Books

Stoeckel,C.: Chapter Piezoelektrische Mikrosysteme : Entwurf, Fertigung und Charakterisierung piezoelektrischer mikroelektromechanischer Wandlersysteme auf Basis von Aluminiumnitrid . in the book: Piezoelektrische Mikrosysteme : Entwurf, Fertigung und Charakterisierung piezoelektrischer mikroelektromechanischer Wandlersysteme auf Basis von Aluminiumnitrid Habilitation , ed. by Stoeckel, Chris (2025) p 232 (ISBN 978-3-96100-255-9)

Papers

Zhao,Z.; Doering,H.; Blangiardi,F.; Gottschall,N.; Schwarzenberg,S.; Beltran,R.B.; Doering,A.; Maier,D.; Streiter,R.; Langer,J.; Heinkel,U.; Kuhn,H.: SenMooVe: A Platform for Sensor-based Air Quality Monitoring in Public Transport Vehicles. 2025 Smart Systems Integration Conference and Exhibition, SSI 2025, Prague (Czech Republic), 2025 Apr 8-10; Proceedings (ISBN 979-833151244-6, 979-8-3315-1245-3)
Rothe,T.; Lauff,A.; Shaporin,A.; Thieme,P.; Sayyed,M.A.; Gottfried,K.; Schuster,J.; Langer,J.; Jaeckel,L.; Stoll,M.; Kuhn,H.: Real-Time Interfacial Pressure Prediction in CMP Using Machine Learning Surrogates of Finite Element Simulations. International Journal of Automation Technology, 19, 5 (2025) pp 879 - 889 (ISSN 1881-7629)
Selvam,K.; Saeidi,N.; Schwarzmann,Y.; Wiemer,M.; Kuhn,H.: Investigation of Capacitive Micromachined Ultrasound Transducer for NDT and material inspection in metals and alloys. 2025 IEEE International Instrumentation and Measurement Technology Conference, I2MTC 2025, Chemnitz (Germany), 2025 May 19-22; Proceedings (ISBN 979-833150500-4, 1091-5281)
Selbmann,F.; Schaller,F.; Song,S.; Kuehn,M.; Roscher,F.; Zimmermann,S.; Kuhn,H.: Parylene C based memristors for the realization of ultra-thin and flexible smart systems. 2025 Smart Systems Integration Conference and Exhibition, SSI 2025, Prague (Czech Republic), 2025 Apr 8-10; Proceedings (ISBN 979-833151244-6)
Winkler,G.; Rothe,T.; Sayyed,M.A.; Jaeckel,L.; Langer,J.; Kuhn,H.; Stoll,M.: Machine Learning in Chemical-Mechanical Planarization: A Comprehensive Review of Trends, Applications, and Challenges. Advanced Engineering Informatics, 68, 103663 (2025) (ISSN 1474-0346)
Mitra,D.; Heinrich,K.; Gierse,S.; Zeiner,C.; Siegel,F.; Willert,A.; Zichner,R.: Direct deposition of catalyst layers on polymer electrolyte membrane (PEM) for fuel cells with controlled platinum distribution by inkjet printing. Journal of Power Sources, 638, 236503 (2025) (ISSN 0378-7753)
Roehlig,D.; Laude,V.; Zichner,R.; Thieme,F.; Thraehnhardt,A.; Blaudeck,T.: Radio wave attenuation by a large-scale photonic crystal sculpture. Scientific Reports, 15, 1 (2025) p 12317 (ISSN 2045-2322)
Zienert,A.; Simon,D.K.; Fiedler,O.; Schuster,J.: Simulation of Gas Flow and Multicomponent Diffusion in a Single Wafer Silicon Epitaxy Reactor. COMSOL Conference 2025, Amsterdam, 2025 Oct 29-31; Poster presentation
Zienert,A.; Jaeckel,L.; Schuster,J.; Zeun,A.; Seidel,A.-S.; Simon,D.K.; Fiedler,O.: Simulation of Si Epitaxy in Single Wafer Reactors. Si-Epi usermeeting, Dresden, 2025 Oct 21-22; Oral presentation
Fuchs,F.; Roscher,W; Dick,D.; Irmscher,C.; Schuster,J.; Gemming,S.: Statistical Studies on Random Configurations of Silicon Germanium Carbon Alloys Using Density Functional Theory. J. Phys. Chem. C, 129, 2 (2025) p 1546–1552
Fuchs,F.; Teichert,F.; Schuster,J.: Simulations to enhance the conductivity of graphene based macromaterials. DPG-Frühjahrstagung der Sektion Kondensierte Materie (SKM), Regensburg, 2025 March 16-21
Fuchs,F.; Teichert,F.; Hermannsdorfer,A.; Niemann,L.; Schulze,P.; Wagner,T.; Stoll,M.; Koehne,M.; Schuster,J.: Digitalization of material properties and processes related to graphene based macro materials. MaterialsWeek, Frankfurt am Main, 2025 Apr 2-4
Bekemeier,S; Rêgo,C.R.C.; Mai,H.L.; Saikia,U; Waseda,U.; Apel,M.; Arendt,F.; Aschemann,A.; Bayerlein,B.; Courant,R.; Dziwis,G.; Fuchs,F.; Giese,U.; Junghanns,K.; et al.: Advancing Digital Transformation in Material Science: The Role of Workflows Within the MaterialDigital Initiative. Advanced engineering materials, 27, 8 (2025) p 2402149
Toerker,E.; Selbmann,F.; Keibler-Willner,C.; Baum,M.; Wiemer,M.: Barrier Layer System and Method for Producing a Barrier Layer System. US12 385 134 B2; filed: 2022 Sep 23; foreign application priority date: 2021 Mar 25
Baum,M.; Brandstaetter,W.; Georgi,R.: Portables Projektions‐Röntgensystem, Verfahren zur Aufnahme von Röntgenbildern und Verfahren zur Korrektur von Bilddaten. AZ: 10 2025 136 362.5, angemeldet am 09.09.2025
Baum,M.; Buelz,D.; Brandstaetter,W.; Maier,D.; Forke,R.; Kuhn,H.: Investigation of potential motion artifacts on the image quality of X-ray images with portable X-ray systems and their compensation. BMT 2025, Muttenz/Basel (Switzerland), 2025 Sep 9-11; Proceedings - Abstracts of the 2025 Joint Annual Conference of the Austrian (ÖGBMT), German (VDE DGBMT) and Swiss (SSBE) Societies for Biomedical Engineering, vol. 70, no. s1 (2025) pp pp. 1-374
Alves da Silva,Leticia; Hermann,S.: Surface functionalization strategies for highly specific DNA hybridization sensing with carbon nanotube-based field-effect transistors . Biosensors 2025 Conference, Lisbon, Portugal, 2025 May 19-22
Mulay,S.; Stoeckel,C.; Ullmann,D.; Meinel,K.; Reuter,D.: Universal PMUTS–Piezoelectric Micromachined Ultrasonic Transducers With An Automatic Wire Bond Process For Adaptive Acoustic Channels. 2025 Smart Systems Integration Conference and Exhibition (SSI), Czech Republic (Prague), 2025 08-10 Apr (ISBN 979-8-3315-1244-6)
Mehraban,Z.; Sayyed,M.; Zieger,S.; Seifert,T.; Haase,M.; Stoll,M.; Langer,J.; Kuhn,H.: Process Data-Driven Virtual Metrology for Bosch Etching: A Gaussian Process Approach Integrating Stationarity Analysis and Functional Principal Component Analysis.[Poster].
Mehraban,Z.; Sayyed,M.A.; Zieger,S.; Seifert,T.; Haase,M.; Stoll,M.; Langer,J.; Kuhn,H.: Process Data-Driven Virtual Metrology for Bosch Etching: A Gaussian Process Approach Integrating Stationary Analysis and Functional Principal Component Analysis [Poster]. Plasma Etch and Strip in Microtechnology (PESM 2025)., June
Seifert,T.; Haase,M.; Sayyed,M.A.; Kuechler,M.; Zieger,S.; Langer,J.; Reuter,D.: Analysis in Deep Reactive Ion Etching Processes Using Optical Emission Spectroscopy and k-Means Clustering [Poster]. Plasma Etch and Strip in Microtechnology (PESM 2025)., June
Hosseini,V.; Valaboju,B.; Umlauf,G.; Haase,M.; Anderson,D.; Reuter,D.: New approach for Silicon Etching: Low-Pressure Vapor-Phase Metal-Assisted Chemical Etching via Catalytic Metal Nanostructures for Advanced Microfabrication. Plasma Etch and Strip in Microtechnology (PESM 2025), June
Zieger,S.; Sayyed,M.A.; Seifert,T.; Haase,M.; Curato,I.V.; Langer,J.; Kuhn,H.: Automating spectral data compression for the Bosch process. European Conference of Advanced Process Control and Manufacturing (apc|m 2025)., April
Sayyed,M.A.; Zieger,S.; Seifert,T.; Rothe,T.; Langer,J.; Haase,M.; Kuhn,H.: Automatic Feature Extraction from Optical Emission Spectra of Reactive Ion Etching Using Dynamic Mode Decomposition. Plasma Processing and Technology International Conference (Plasma Tech 2025), April
Zieger,S.; Sayyed,M.A.; Seifert,T.; Haase,M.; Curato,I.V.; Langer,J.; Kuhn,H.: Virtual Metrology for the Bosch Process: A Knowledge-Driven Approach to Spectral Data Compression. Plasma Etch and Strip in Microtechnology (PESM 2025), June
Seifert,T.; Sayyed,M.A.; Kuechler,M.; Zieger,S.; Langer,J.; Reuter,D.; Haase,M.: Optical Emission Spectroscopy Analysis of the BOSCH Process Utilizing k-Means Clustering and Dynamic Mode Decomposition. IEEE International Conference on Plasma Science (ICOPS 2025), June
Sayyed,M.A.; Zieger,S.; Seifert,T.; Langer,J.; Haase,M.; Kuhn,H.: Hybrid Spectral Data Compression for Efficient and Interpretable BOSCH Process Monitoring. IEEE International Conference on Plasma Science (ICOPS 2025), June
Wecker,J.; Tank,F.; Schermer,S.; Stoeckel,C.; Helke,C.; Shaporin,A.; Schumann,A.-K.; Martin,J.; Forke,R.; Hiller,K.; Haase,M.; Weiss,A.; Reuter,D.: Nanolithographic Waveguides, Couplers and Ring Resonators made of Si3N4 and AIN for Photonics and Quantum Technologies . 2025 Smart Systems Integration Conference and Exhibition (SSI)
Schumann,A.-K.; Wecker,J.; Tank,F.; Stoeckel,C.; Hiller,K.; Reuter,D.; Martin,J.; Forke,R.; Weiss,A.: Comparison of two types of silicon nitride grating couplers for 1550nm wavelength with slots and square holes and different deposition methods. Integrated Optics: Design, Devices, Systems, and Applications VIII