Publications
Publications of our scientific work
Frank Schettler, TU Chemnitz
Year 2025
Books
| Stoeckel,C.: Chapter Piezoelektrische Mikrosysteme : Entwurf, Fertigung und Charakterisierung piezoelektrischer mikroelektromechanischer Wandlersysteme auf Basis von Aluminiumnitrid . in the book: Piezoelektrische Mikrosysteme : Entwurf, Fertigung und Charakterisierung piezoelektrischer mikroelektromechanischer Wandlersysteme auf Basis von Aluminiumnitrid Habilitation , ed. by Stoeckel, Chris (2025) p 232 (ISBN 978-3-96100-255-9) |
Papers
| Song,S.; Diyatmika,W.; Ruhl,G.; Van Dyck,S.; Heller,R.; Busch,A.; Zimmermann,S.; Hess,J: Influence of Sputtering Parameters on the Stoichiometry and Crystallization Behavior of Germanium Telluride (GeTe) Films Grown by Confocal Magnetron Sputtering. E/PCOS 2025 Conference, Marseille (France), 2025 Sep 24-26; Poster |
| Sayyed,M.A.; Seifert,T.; Zieger,S.; Schwarzenberg,S.; Deshmukh,A; Haase,M.; Langer,J.: A Multi-Model Dataset for BOSCH Plasma-Etching: Optical Emission Spectra, Process Parameters, and Wafer Measurements for Data-Driven Plasma Modeling. Zenodo |
| Schermer,S.; Helke,C.; Haase,M.; Gottwald,M.; Kohlschreiber,P.; Bonitz,J.; Umlauf,G.; Hiller,K.; Reuter,D.: Sophisticated 3D Patterning by E-Beam and i-line Grayscale Lithography and followed RIE and DRIE structure transfer to enable future photonic, NEMS and MEMS application fields. MST2025; Proceedings, pp 1-4 |
| Kohlschreiber,P.; Gottwald,M.; Helke,C.; Biller,H.; Sendel,M.; Reuter,D.: Evaluation of HSQ resist Medusa 84 SiH regarding suitability for various process windows. 40th European Mask and Lithography Conference (EMLC 2025), Dresden, 23. September 2025; Proc. SPIE 13787, 137871E (2025) (2025) |
| Gottwald,M.; Kohlschreiber,P.; Kathiriya,D.; Schermer,S.; Helke,C.; Reuter,D.; Sendel,M.; Biller,H.: Development of an intra-level mix-and-match lithography process using negative-tone photoresist AR-N 4400-10 S4 to combine i-line stepper and electron beam exposure. 40th European Mask and Lithography Conference (EMLC 2025), Dresden, 23. September 2025; Proc. SPIE 13787, 137871H (2025) |
| Sayyed,M.A.; Zieger,S.; Seifert,Tom; Rothe,T.; Langer,J.; Haase,M.; Kuhn,H.: Automatic Feature Extraction from Optical Emission Spectra of Reactive Ion Etching Using Dynamic Mode Decomposition. Plasma Processing and Technology International Conference 2025, Albufeira, 2025 Apr 23-25; Proceedings |
| Sayyed,M.A.; Seifert,Tom; Ziegler,S.; Schwarzenberg,S.; Deshmukh,A.; Haase,M.; Langer,J.: A Multi-Model Dataset for BOSCH Plasma-Etching: Optical Emission Spectra, Process Parameters, and Wafer Measurements for Data-Driven Plasma Modeling. Dataset |
| Sayyed,M.A.; Zieger,S.; Seifert,Tom; Haase,M.; Langer,J.; Kuhn,H.: Hybrid Spectral Data Compression for Efficient and Interpretable BOSCH Process Monitoring. IEEE Pulsed Power & Plasma Science Conference – PPPS 2025, Berlin, 2025 Jun 16-20; Proceedings |
| Mehraban,Z.; Sayyed,M.A.; Zieger,S.; Seifert,Tom; Haase,M.; Stoll,M.; Langer,J.; Kuhn,H.: Process Data-Driven Virtual Metrology for Bosch Etching: A Gaussian Process Approach Integrating Stationary Analysis and Functional Principal Component Analysis. Plasma Etch And Strip In Microtechnology 2025, Chemnitz, 2025 Jun 16-17; Proceedings |
| Zieger,S.; Sayyed,M.A.; Seifert,Tom; Haase,M.; Curato,I.V.; Langer,J.; Kuhn,H.: Virtual Metrology for the Bosch Process: A Knowledge-Driven Approach to Spectral Data Compression. Plasma Etch And Strip In Microtechnology 2025, Chemnitz, 2025 Jun 16-17; Proceedings |
| Zieger,S.; Sayyed,M.A.; Seifert,Tom; Haase,M.; Curato,I.V.; Langer,J.; Kuhn,H.: Automating spectral data compression for the Bosch Process. European advanced process control and manufacturing - Conference APCM, Prag, 2025 Apr 8-10; Proceedings |
| Janssen,M.; Hann,J.; Selyshchev,O.; Meinecke,C.; Otto,T.; Schulz,S.E.; Zahn,D.R.T.; Blaudeck,T.: Investigations of storage stability for DNA origami in water and defect analysis. . Smart Systems Integration Conference and Exhibition (SSI), Prague, Czech Republic, 2025; IEEE Xplore, pp 1-6 (ISBN 979-8-3315-1244-6) |
| Eugene Christo,VR; Meinecke,C.; Nitzsche,B.; Lyttleton,R.; Reuther,C.; Reuter,D.; Linke,H.; Korten,T,; Diez,St.: DNA Origami Based Approach for an Electrically Driven Single-Photon Source for Contaminant Detection in Water. bioRxiv:2025.09.10.675367 |
| Seifert,Tom; Haase,M.; Sayyed,M.A.; Kuechler,M.; Zieger,S.; Langer,J.; Reuter,D.: Optical Emission Spectroscopy Analysis of the BOSCH Process Utilizing k-Means Clustering and Dynamic Mode Decomposition. IEEE Pulsed Power & Plasma Science Conference – PPPS 2025, Berlin, 2025 Jun 16-20; Proceedings |
| Seifert,Tom; Haase,M.; Sayyed,M.A.; Kuechler,M.; Zieger,S.; Langer,J.; Reuter,D.: Analysis in Deep Reactive Ion Etching Processes Using Optical Emission Spectroscopy and k-Means Clustering. Plasma Etch And Strip In Microtechnology 2025, Chemnitz, 2025 Jun 16-17; Proceedings |
| Schermer,S.; DeMoor,S.; Zanzal,A.; Reynolds,P.; Bonitz,J.; Bieling,J.; Helke,C.; Voigt,A.; Reuter,D.: Optimizing reticle based high throughput i-line grayscale projection lithography for 3D structures. MNE - International Micro and Nao Engineering Conference 2025, Southampton (UK), 2025 Sept 15-18; Proceedings, pp pp 1-2 |
| Kohlschreiber,P.; Gottwald,M.; Helke,C.; Biller,H.; Sendel,M.; Reuter,D.: Investigation of process windows for alternative non-toxic and metal ion free developer choline hydroxide for HSQ resist Medusa 84 SiH. MNE - International Micro and Nao Engineering Conference 2025, Southampton (UK), 2025 Sept. 15-18; Proceedings, pp pp 1-2 |
| Gottwald,M.; Schermer,S.; Ambar,R; Kohlschreiber,P.; Helke,C.; Biller,H.; Sendel,M.; Reuter,D.: Investigation of Intra-Level Mix-and-Match lithography approach in AR-N 7520new for use in a Mix-and-Match grayscale lithography process. MNE - International Micro and Nao Engineering Conference 2025, Southampton (UK), 2025 Sept 15-18; Proceedings, pp pp 1-2 |
| Boehm,L.; Kohlschreiber,P.; Haase,M.; Helke,C.; Reuter,D.: Influence of substrate properties and addition of oxygen on the process of reactive ion etching to optimize the nanopatterning of silicon structures. MNE - International Micro and Nao Engineering Conference 2025, Southampton (UK), 2025 Sept 15-18; Proceedings, pp pp 1-2 |
| Schermer,S.; DeMoor,S.; Zanzal,A.; Reynolds,P.; Helke,C.; Voigt,A.; Reuter,D.: High throughput i-line grayscale exposure for 3D optical components and MEMS applications. EMLC - European Mask and Lithography Conference 2025, Dresden, 2025 Jun 16-18; Proceedings, pp pp 1-2 |
| Kohlschreiber,P.; Gottwald,M.; Helke,C.; Biller,H.; Sendel,M.; Reuter,D.: Evaluation of HSQ Resist Medusa 84 SiH regarding suitability for various process windows. Proceedings, pp pp 1-2 |
| Helke,C.; Schermer,S.; Borisov,M.; Chelubeev,D; Chernik,V; Rakhovskiy,V; Shamaev,A; Spoerl,C; Konstantinou,G; Meer,H; Reuter,D.: Validation of Sub Wavelength Holographic Lithography in a Semiconductor Related Approach within the EU Funded Project HoliSTEP. EMLC - European Mask and Lithography Conference 2025, Dresden, 2025 Jun 16-18; Proceedings, pp pp. 1-2 |
| Helke,C.; Schermer,S.; Gottwald,M.; Kohlschreiber,P.; Bonitz,J.; Haase,M.; Umlauf,G.; Reuter,D.: 3D Patterning by Electron Beam and I-line Grayscale Lithography Combined with RIE, DRIE and IBE for Photonic Applications. PESM - Plasma Etch And Strip In Microtechnology 2025, Chemnitz, 2025 Jun 16-17; Proceedings, pp pp. 1-2 |
| Schermer,S.; Gottwald,M.; Kohlschreiber,P.; Bonitz,M.; Haase,M.; Umlauf,G.; Reuter,D.: 3D Patterning by Electron Beam and I-line Grayscale Lithography Combined with RIE, DRIE and IBE for Photonic Applications. PESM - Plasma Etch And Strip In Microtechnology 2025, Chemnitz, 2025 Jun 16-17; Proceedings, pp pp. 1-2 |
| Schermer,S.; Bieling,J.; DeMoor,S.; Zanzal,A.; Reynolds,P.; Helke,C.; Bonitz,J.; Voigt,A.; Reuter,D.: Optimizing reticle based high throughput i-line grayscale projection lithography for 3D structures with low surface roughness. Micro and Nano Engineering, 28 (2025) |
| Liebing,N.; Koerner,C.; Dreyer,R.; Wagner,M.; Bauer,H.G.; Woltersdorf,G.: Frequency multiplication by collective nanoscale spin-wave dynamics.. Spin, Waves, and Interactions, Greifswald, 2025 Sept. 03; Proceedings |
| Schmid,M.; Boettger,S.; Ernst,M.; Hermann,S.; Kavun,E.; Katzenbeisser,S.: Nanomaterial-based platform electronics for PUF circuits with extended entropy sources (NanoSec2). DATE25, Lyon, 2025 Feb 2; Poster |
| Boettger,S.; Iffland,T.; Hartmann,M.; Alves da Silva,L.; Saupe,R.; Hermann,S.: Repealing the Responsivity to Selectivity-Compromise of Carbon Nanotube-based Hydrogen Sensors by Polymer/Noble-Metal Functionalization. IEEE Sensors, Vancouver, 2025 Oct 20-22; Proceedings |
| Forke,R.; Shaporin,A.; Hahn,S.; Weidlich,S.; Kuechler,M.; Wuensch,D.; Buelz,D; Hiller,K.: On the Feasibility of the BDRIE-HS* Technology for a MEMS Gyroscope. 2025 IEEE International Symposium on Inertial Sensors and Systems (INERTIAL), Lindau (Germany), 2025 May 10-13; Proceedings (ISBN 979-8-3503-8932-6) |