Center for Micro and Nano Technologies
Job Details
Center for Micro and Nano Technologies 

#26-09Development of Dry and Wet Etching Processes for AlScN-Based MEMS devices

Addressed topics: MEMS

Student research project   Master-Thesis  

Aluminum Scandium Nitride (AlScN) has emerged as a key material for next-generation MEMS, RF devices, resonators, sensors, and piezoelectric actuators due to its outstanding piezoelectric properties. However, the fabrication of high-quality AlScN microstructures requires advanced and well-controlled etching processes. In particular, achieving high etch rates, steep sidewalls, good selectivity, and low surface damage remains a significant technological challenge.

At the Center for Micro and Nano technologies (ZfM) and Fraunhofer ENAS, we are developing advanced microfabrication processes for functional thin-film materials. Fraunhofer ENAS operates one of the very few 200 mm Pulsed Laser Deposition (PLD) systems available worldwide in a research environment, enabling the deposition of AlScN thin films with scandium contents of up to 40%. To enable the future integration of this high-performance material into our MEMS process flows, a robust and well-characterized etching process for this challenging material is required. The goal of this project is to develop and optimize dry etching processes for AlScN thin films and investigate complementary wet-etching as well as combined wet/dry etching approaches.

        What will you do?

  •          Conducting a comprehensive literature review on plasma and wet etching of AlScN
  •          Investigate chlorine-based dry etching chemistries (e.g., Cl?/BCl?/Ar) in an ICP-RIE process environment.
  •          Systematically optimize key etching parameters to optimize the etching
  •         Evaluate etch performance with respect to etch rate, uniformity, as well as process reproducibility.
  •          Characterize etched structures using optical inspections and scanning electron microscopy (SEM).

  •          Develop and validate an optimized etching recipe for future AlScN based MEMS and piezoelectric device fabrication.

ยท                 What will you bring?

  •          You study Microsystems Engineering, Physics, Electrical Engineering or a related field

  •          Interest in semiconductor technology, MEMS fabrication, and plasma processing

  •          Basic understanding of plasma processes and thin-film deposition is advantageous

  •          Familiarity with cleanroom fabrication processes is a plus


    We are currently seeking candidates for Master's Research Projects and theses and internship positions. 

Contact

M.Sc. Shubham Mulay

When contacting us, please always refer to the job id #26-09 and the job title.