PESM 2026: International Plasma Etch Workshop Moves to Grenoble – Call for Papers
23.Jan.2026 Reseach News
Our team is proud to support the alignment of this event, which provides a unique forum for open discussions between scientific researchers and industrial technology experts.
A Forum for Science and Industry
The PESM workshop is dedicated to scientists, process engineers, PhD students, and industrial partners working in the field of dry etching. The scope extends beyond standard plasma processing to include other vacuum-based removal techniques (ion beam, neutral beam, gaseous thermal etching) and complex cleaning processes (dry-wet interactions, nanostructure collapse, and corrosion issues).
Focus Areas for 2026
ESM 2026 will address critical challenges in plasma etching and cleaning, with a program featuring invited talks by scientific and technical leaders. Key topics include:
- Advanced CMOS, Memory & Quantum Technologies: Including GAA Nanowire Transistors, OXRAM, PCRAM, MRAM, and FeRAM.
- "More than Moore" Applications: Focusing on MEMS, photonics, imagers, power electronics, LEDs, and solar cells.
- Emerging Concepts: Atomic Layer Etching (ALE), TSD, Isotropic Etching, and cryogenic processes.
- Fundamental Aspects: New plasma sources, diagnostics, modeling, and the integration of Machine Learning/AI.
- Sustainability: A newly introduced session dedicated to sustainable processes and eco-friendly manufacturing solutions.
Important Dates for Authors
Researchers and industry professionals are invited to submit their contributions. Please mark the following dates in your calendar:
- 19 January 2026: Opening of Submission
- 27 February 2026: Abstract Submission Deadline
Registration and Further Information
For detailed information regarding the program, venue, and submission guidelines, please visit the official conference website:
Visit the PESM 2026 Official Website