Best paper ward to our ALD team for their work on Co-deposition

03.Jul.2025   Reseach News

Our ALD team was recently awarded by the American Vacuum Society (AVS) for their paper "Low-temperature ALD of metallic cobalt using the CoCOhept precursor: Simulation-assisted process development for deposition on temperature sensitive 3D-structures". 

From the four MAIN authors on the picture, Mathias Franz, Linda Jäckel, Xiao Hu and Lysann Kassner, three are members of ZfM. Their work is a nice example, how simulation of processes and surface chemistry can be combined with lab-scale research in order to achieve a high performance deposition process. Here we demonstrate, how temperature sensitive substrates can be coated with ultra-thin conformal Co-films.

Learn more about this work in our publication which is available online as open access: https://doi.org/10.1116/6.0004248

You can also have a look on the press relase by Chemnitz university of technology and the award web page by the AVS.