EU SEA: ACTION : Advanced CVD tool for integration of organosilicated nanoporous films
Prof. T. Gessner / Dr. S. E. Schulz
ST Microelectronics, Crolles (F)
AMD Saxony LLC & Co KG (D), Philips Res. Leuven (B), LETI Grenoble (F), Sematech (USA), TRIKON Technologies (UK)
01.05.2002 to 31.01.2004
(selected) Provide organosilicated glass (OSG) material with a k-value of 2.2 for interconnect applications for the 90 nm node; Prove cluster tool for full inter metal dielectric (IMD) stack; Demonstrate flexibility for customized dual-damascene stack architectures; Show Cost-effectiveness compared to multi-tool Spin-on Dielectrics (SOD) methods; Demonstrate performance within a 300 mm production environment. www.sea.rl.ac.uk