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Center for Micro and Nano Technologies
Project Details
Center for Micro and Nano Technologies 

EU: ULISSE : Ultra low k dielectrics for Damascene copper interconnects schemes


Dr. Stefan E. Schulz
Prof. Thomas Geߟner
Infineon Technologies, Philips, IMEC, ST Microelectronics, Bull, LETI Grenoble
01.10.2001 to 31.08.2003

Integration of ultra low k dielectrics