Looking back on a succesful PESM 2025 in Chemnitz with a strong contribution from HaloFreeEtch

09.Jul.2025   Reseach News

We are proud to look back on the 15th Plasma Etch and Strip in Microtechnology (PESM) Workshop, where leading experts from science and industry came together in the heart of Saxony. The event focused on advanced plasma etching, vacuum-based removal technologies, and sustainable semiconductor processing.

PESM 2025 brought together key players from Europe’s microelectronics clusters – Grenoble, Leuven, and Silicon Saxony – to foster exchange, drive knowledge and technology transfer, and strengthen cross-border collaboration.

Our colleagues from TU Chemnitz together with Fraunhofer ENAS shared exciting insights into our latest research:
The dry etching team and the simulation team presented innovative halogen-free etching solutions for silicon and glass, developed as part of the EU project HaloFreeEtch – contributing to greener microfabrication processes, on posters and as an oral presentation.

We’re thrilled about the success of PESM 2025 and grateful for the innovation, networking, and knowledge exchange it inspired. After an outstanding first day, day two offered even more valuable insights and stimulating discussions.