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Center for Micro and Nano Technologies
ZfM
Center for Micro and Nano Technologies 

The Research Center

The ZfM is one of the world's leading research centers in the field of microsystems technology and nano technologies. The aim is research and development of new technologies for the micro and nanosystems of tomorrow.

The focus of the developments is set on miniaturization, energy requirements, performance and resource efficiency of micro and nanosystems. Together with partners from industry and research, we bring the developments into application.

Research News

Nanolot - gradierte Nanoverbundwerkstoffe mit funktionsorientierten Eigenschaften zur Verarbeitung mit additiven Fertigungstechnologien

Nanolot - gradierte Nanoverbundwerkstoffe mit funktionsorientierten Eigenschaften zur Verarbeitung mit additiven Fertigungstechnologien

Within the NANOLOT research project innovative nanocomposite materials with new functional properties for substrate-bonding have been developed. With help of a specific, additive manufacturing process - aerosol jet technology - not only binary solder systems based on nanoparticles have been deposited, but also defined mixing ratios of two different nanoparticle materials or nanoparticle inks are could be set and applied for chip-level bondingRead more

TU Chemnitz erhält Platz auf der Weltkarte für mikromechanische Ultraschallwandler

TU Chemnitz erhält Platz auf der Weltkarte für mikromechanische Ultraschallwandler

TUCaktuell berichtet über die aktuellen Entwicklungen im Bereich piezoelektrischer, mikromechanischer UltraschallwandlerRead more

Low-temperature ALD of metallic cobalt using the CoCOhept precursor: Simulation-assisted process development for deposition on temperature sensitive 3D-structures

Low-temperature ALD of metallic cobalt using the CoCOhept precursor: Simulation-assisted process development for deposition on temperature sensitive 3D-structures

This work presents the development and implementation of a low-temperature atomic layer deposition (ALD) process for metallic cobalt thin films. Computational analysis identified CoCOhept as the most promising candidate among a series of potential precursors. Simultaneously to the process development with CoCOhept, the chamber geometry has been co-optimized using computational fluid dynamics simulation. By this, the chamber height was identified as a critical factor for a homogenous precursor distribution. The predictions by the model are in good agreement with experiments employing varying chamber geometries. We demonstrate the integration of the process in high aspect-ratio silicon structures and on temperature sensitive 3D-photoresist structures.Read more

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